Semiconductor element and method of making same

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United States of America Patent

SERIAL NO

12801974

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Abstract

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A semiconductor element includes a substrate including gallium oxide and having a predetermined plane direction, and a semiconductor layer formed on the substrate, in which, the semiconductor element is in chip form and further includes a first end face formed along a cleaved surface of the substrate and a second end face formed perpendicular to the first end face, wherein the first end face has a stronger cleavage property than the second end face.

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Patent Owner(s)

Patent OwnerAddress
KOHA CO LTDTOKYO JAPAN TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aoki, Kazuo Tokyo, JP 157 2601
Hirata, Koji Aichi-ken, JP 343 2351
Ikemoto, Yuhei Aichi-ken, JP 11 133
Kaneko, Yukio Tokyo, JP 64 538
Ujiie, Takekazu Tokyo, JP 2 28

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