Method of adjusting laser beam pitch by controlling movement angles of grid image and stage
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United States of America Patent
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Issued Date -
Oct 7, 2010
app pub date -
Jul 21, 2009
filing date -
Apr 6, 2009
priority date (Note) -
Abandoned
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Abstract
The present invention relates to a method of adjusting a laser beam pitch by controlling the movement angles of a grid image and a stage, which is intended to solve the conventional problem in that, when exposure is performed after only a stage is moved in a diagonal direction while an exposure mask image is not rotated, an exposed image is distorted into the shape of a parallelogram. In the method, a factor K for repeated patterns is defined based on exposure parameter data. Thereafter, a rotation angle θ is obtained through computational processing. The stage is moved by the obtained rotation angle θ in a diagonal direction. A grid image rotated by the obtained rotation angle θ is generated. Therefore, the pitch between laser beams radiated onto the exposed surface of a board is adjusted through a DMD module, thus realizing high-resolution LER.
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