METHOD AND DEVICE FOR CHARACTERIZING SILICON LAYER ON TRANSLUCENT SUBSTRATE
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United States of America Patent
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Issued Date -
Oct 7, 2010
app pub date -
Mar 19, 2010
filing date -
Apr 3, 2009
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Abandoned
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Abstract
A method for the characterization of a silicon layer on a translucent substrate, in particular, for the characterization of a solar cell blank, includes detecting by at least one optical detector, the light transmitted through the silicon layer and/or reflected on the silicon layer. The method also includes determining a degree of absorption of the silicon layer for at least one wavelength by means of the detected light. The method further includes determining a quantity ratio between an amorphous fraction and a crystalline fraction of the silicon layer or between one of these fractions and the total of these fractions by means of the degree of absorption.
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