Methods of Patterning Substrates Using Microcontact Printed Polymer Resists and Articles Prepared Therefrom
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United States of America Patent
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Issued Date -
Oct 7, 2010
app pub date -
Apr 1, 2010
filing date -
Apr 1, 2009
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Abandoned
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Abstract
The present invention is directed to methods for patterning substrates using contact printing to form patterns comprising a polymer, using the patterns formed therefrom as resists, and process products formed by the process.
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