Feedback and feedforward control of a semiconductor process without output values from upstream processes
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Sep 23, 2010
app pub date -
Mar 18, 2009
filing date -
Mar 18, 2009
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The present invention discloses a feedback and feedforward process control system, comprising the steps: 1.) Determining an output variable that is highly correlated with the controlled variable, the variation of which is mainly influenced by upstream processes rather than current process, 2.) Processing a semiconductor wafer with a first set of parameters, 3.) Measuring the output variable that is highly correlated with the controlled variable after the semiconductor wafer is processed, 4.) Developing a predictive feedforward signal based on the output variable, 5.) Measuring the controlled variable after the semiconductor wafer is processed to be used as feedback signal, and 6.) Determining a second set of parameters based on feedback and feedforward signals.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully