Method of Chemical Mechanical Polishing

United States of America Patent

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Issued Date
Sep 23, 2010
app pub date
Sep 25, 2009
filing date
Mar 18, 2009

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Abandoned

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Abstract

[Problem] To improve polishing efficiency while lowering shear force added to semiconductor wafers while increasing polishing speed, without damaging the wafer's processing surface or the membrane under it.is ideal conditions.

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Patent Owner(s)

Patent Owner	Address
ARACA INC	2550 EAST RIVER ROAD APT 12204 TUCSON AS 85718
TOKYO ELECTRON INC	AKASAKA BIZ TOWER AKASAKA 5-3-1 MINATO-KU TOKYO
TOHOKU NATIONAL UNIVERSITY OF KATAHIRA	2-1-1 SENDAI-SHI MIYAGI-KEN

International Classification(s)

B24B:MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR PO....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Gu, Xun	Sendai-shi, JP	20	59
Nemoto, Takenao	Tokyo, JP	15	86
Ohmi, Tadahiro	Sendai-shi, JP	798	14083
Philipossian, Ara	Tucson, US	36	607
Sampurno, Yasa	Tucson, US	13	54
Teramoto, Akinobu	Sendai-shi, JP	114	811

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Method of Chemical Mechanical Polishing

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United States of America Patent

12567092

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