ULTRASONIC FILTRATION FOR CMP SLURRY
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United States of America Patent
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Issued Date -
Aug 19, 2010
app pub date -
Feb 19, 2009
filing date -
Feb 19, 2009
priority date (Note) -
Abandoned
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Abstract
The present invention relates to semiconductor processing. In particular, it relates to a tunable ultrasonic filter and a method of using the same for more effective separation of large particles from slurry. In one embodiment a standing wave is produced in the filter and large particles are accumulated at the nodes of the standing waves while the slurry is flowed out of the filter.
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