DEPOSITION METHOD AND DEPOSITION APPARATUS FOR NITRIDE FILM
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United States of America Patent
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Issued Date -
Aug 12, 2010
app pub date -
Jul 18, 2008
filing date -
Jul 20, 2007
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Abandoned
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Abstract
A deposition method of depositing a nitride film, including steps of introducing one or more nitrogen supplying gas selected from hydrazine and nitrogen oxides into a catalyst reaction apparatus; enabling a reactive gas generated by contacting the nitrogen supplying gas with catalyst to be spouted out from the catalyst reaction apparatus; and reacting the reactive gas with a compound gas, thereby depositing a nitride film on a substrate is disclosed.
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