Plasma generating system having nozzle with electrical biasing
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United States of America Patent
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Issued Date -
Aug 12, 2010
app pub date -
Feb 9, 2009
filing date -
Feb 9, 2009
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Abandoned
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Abstract
The present invention provides a plasma generating system that includes: a microwave generator for generating microwave energy; a power supply connected to the microwave generator for providing power thereto; a microwave cavity; a waveguide operatively connected to the microwave cavity for transmitting microwave energy thereto; an isolator for dissipating microwave energy reflected from the microwave cavity; and at least one nozzle coupled to the microwave cavity. The nozzle includes: a housing having a generally cylindrical space formed therein, the space forming a gas flow passageway; a rod-shaped conductor disposed in the space and operative to transmit microwave energy along a surface thereof so that the microwave energy excites gas flowing through the space; and a biasing device for providing a bias potential between the rod-shaped conductor and a bias electrode structure wherein the bias electrode structure is offset in potential from ground.
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