Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses
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Feb 6, 2009
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Feb 6, 2009
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mbar, e.g., by providing an inert gas flow of at least about 600 sccm in certain example embodiments. Tube rotation is reduced to less than about 5 RPM. The power provided to the apparatus is adjusted in dependence on the presence or absence of oxygen partial pressure oscillations. TCOs such as, for example, ITO, ZnAlOx, SnSbOx, may be deposited according to the techniques of certain example embodiments.
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