METHOD FOR ULTRASONIC CLEANING OF CONTAMINATION ATTACHED TO A SURFACE OF AN OBJECT

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United States of America Patent

SERIAL NO

12756504

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Abstract

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An ultrasonic cleaning method in which ultrasonic cleaning of a contamination attached to a surface of an object to be cleaned is performed by directing toward the object to be cleaned, a cleaning liquid to which ultrasonic waves are applied by alternately focusing first ultrasonic waves having a frequency of 1 to 10 MHz and second ultrasonic waves having a frequency equal to or lower than ½ of that of the first ultrasonic waves. A focus position adjustment device is used to adjust the distance of the focus position relative to the surface of the object to be cleaned, and a moving device is used to movie at least one of the ultrasonic wave generation device and a support base for the object so that the effect of the ultrasonic waves generated by the ultrasonic wave generation device on the surface of the object to be cleaned is uniform.

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Patent Owner(s)

Patent OwnerAddress
HITACHI PLANT TECHNOLOGIES LTDTOKYO JAPAN TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
IKEDA, Teiichirou Tokyo, JP 2 21
KITADA, Yoshimitsu Matsudo-shi, JP 3 38
MATSUMOTO, Youichirou Tokyo, JP 2 21
SAHARA, Terutaka Tokyo, JP 3 38
TSUMAKI, Nobuo Tokyo, JP 14 659
YOSHIZAWA, Shin Tokyo, JP 9 60

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