APPARATUS FOR SUB-ZERO DEGREE C ION IMPLANTATION
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United States of America Patent
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N/A
Issued Date -
Jul 22, 2010
app pub date -
Jan 21, 2009
filing date -
Jan 21, 2009
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An ion implanter that comprises a chuck assembly having a chuck to clamp, hold, and cool a wafer is disclosed. The chuck is cooled by a cooling assembly circulated with a special coolant, such that the chuck can be maintained at very low temperatures. A mechanical design is provided to minimize the direct surface-to-surface contact area between the chuck and a base, which is employed to support the chuck. The mechanical design includes fasteners for providing mechanical support between the chuck and the base and thermal insulators for providing thermal insulation between the chuck and the base.
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