Extreme ultraviolet light source
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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app pub date -
Dec 14, 2009
filing date -
Oct 16, 2000
priority date (Note) -
Abandoned
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Abstract
An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.
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