REFURBISHED SPUTTERING TARGET AND METHOD FOR MAKING THE SAME
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United States of America Patent
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Issued Date -
Jul 8, 2010
app pub date -
Jul 6, 2009
filing date -
Jan 7, 2009
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Abandoned
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Abstract
A method for making a refurbished sputtering target has steps of providing a spent target with a backside, an eroded side and a rim; mechanically pre-treating the backside of the spent target; applying powder material that has the same composition as the spent target to form a powder-filled layer; and sequentially pre-pressing and sintering the spent target with the powder-filled layer to obtain the refurbished sputtering target. Therefore, a percentage of the spent target is reduced by mechanically treating the backside of the spent target, so the refurbished sputtering target has a consistent quality.
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