PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A DISPLAY SUBSTRATE USING THE PHOTORESIST COMPOSITION
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United States of America Patent
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N/A
Issued Date -
Jul 1, 2010
app pub date -
Sep 10, 2009
filing date -
Dec 29, 2008
priority date (Note) -
Abandoned
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Abstract
A photoresist composition includes a novolac resin, a benzophenone photosensitizer and an ethylidyne tris phenol photosensitizer, and an organic solvent. Thus, a micropattern having a higher resolution than the resolution of an exposure apparatus is formed to decrease an amount of exposure and/or exposure time, thereby improving manufacturing reliability and productivity.
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