Oxime sulfonates and the use thereof as latent acids

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United States of America Patent

APP PUB NO 20100167178A1
SERIAL NO

12308279

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Abstract

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comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.

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Patent Owner(s)

Patent OwnerAddress
YAMATO HITOSHINot Provided

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Asakura, Toshikage Osaka, JP 28 655
Irie, Makiko Kanagawa-ken, JP 26 145
Iwai, Takeshi Kanagawa-ken, JP 75 842
Nakayama, Kazuhiko Beaverton, US 75 251
Nishimae, Yuichi Osaka, JP 35 174
Yamato, Hitoshi Hyogo, JP 33 712

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