Patterning Processes Comprising Amplified Patterns
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United States of America Patent
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Issued Date -
Jul 1, 2010
app pub date -
Jun 29, 2009
filing date -
Jun 27, 2008
priority date (Note) -
Abandoned
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Abstract
The present invention is directed to substrates comprising amplified patterns, methods for making the amplified patterns, and methods of using the amplified patterns to form surface features on the substrates.
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