Method and apparatus for analyzing a group of photolithographic masks
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United States of America Patent
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Sep 11, 2012
Grant Date -
Jun 24, 2010
app pub date -
Jul 11, 2008
filing date -
Jul 12, 2007
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Abstract
The invention relates to a method for analyzing a group of at least two masks for photolithography, wherein each of the masks comprises a substructure of a total structure, which is to be introduced in a layer of the wafer in the lithographic process, and the total structure is introduced in the layer of the wafer by introducing the substructures in sequence. In this method, a first aerial image of a first one of the at least two masks is recorded, digitized and stored in a data structure. Then, a second aerial image of a second one of the at least two masks is recorded, digitized and stored in a data structure. A combination image is generated from the data of the first and second aerial images, which combination image is represented and/or evaluated.
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