PLASMA PROCESSING APPARATUS AND MANUFACTURING METHOD OF DEPOSITION-INHIBITORY MEMBER
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United States of America Patent
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Issued Date -
Jun 17, 2010
app pub date -
May 14, 2008
filing date -
May 18, 2007
priority date (Note) -
Abandoned
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Abstract
A plasma processing apparatus of the present invention performs on a substrate to be processed, plasma processing with a noble metal material and a ferroelectric material and is provided with a constituent member that is exposed to plasma while being heated. The constituent member is formed with an aluminum alloy of at least 99% aluminum purity.
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