POLISHING PAD HAVING INSULATION LAYER AND METHOD FOR MAKING THE SAME
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United States of America Patent
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Issued Date -
Jun 17, 2010
app pub date -
Aug 5, 2009
filing date -
Dec 15, 2008
priority date (Note) -
Abandoned
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Abstract
The present invention relates to a polishing pad having an insulation layer and a method for making the same. The polishing pad includes a bottom layer, an insulation layer, and an abrasive layer. The bottom layer includes a fabric layer wrapped in a high polymer. The insulation layer is disposed on the bottom layer. The abrasive layer is disposed on the insulation layer. The abrasive layer is a high polymeric elastomer and has a plurality of columnar-like cells. The insulation layer can prevent the slurry from infiltrating into the bottom layer during the polishing processs to improve the polishing effect and quality.
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