BiMO PARTICLE MANUFACTURING METHOD AND PHOTOCONDUCTIVE LAYER
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United States of America Patent
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Issued Date -
May 27, 2010
app pub date -
Nov 25, 2009
filing date -
Nov 27, 2008
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Abstract
A method for manufacturing a BiMO particle (M is either one of Si, Ge, Ti, and Sn), in which at least one type of compound selected from the group consisting of a silicon compound, a germanium compound, a titanium compound, and a tin compound is reacted with a bismuth compound by agitating and mixing the compounds in an alkali water solution in the presence of an amino compound.
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