PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD

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United States of America Patent

SERIAL NO

12403526

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Abstract

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A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT AGRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Beckenbach, Mariella Heilbronn, DE 1 17
Bertele, Andreas Koenigsbronn, DE 5 32
Bleidistel, Sascha Aalen, DE 43 267
Frommeyer, Andreas Schwaebisch Gmuend, DE 8 44
Gruner, Toralf Aalen-Hofen, DE 173 1727
Hoegele, Artur Oberkochen, DE 32 124
Hummel, Wolfgang Aalen, DE 39 362
Rief, Klaus Aalen-Oberalfingen, DE 16 137
Schletterer, Thomas Stadtroda, DE 19 135
Schoeppach, Armin Aalen, DE 44 250
Schwaer, Baerbel Aalen, DE 8 134
Schwaer, Jochen Aalen, DE 1 17
Sigel, Benjamin Aalen, DE 10 45

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Patent Citation Ranking

  • 17 Citation Count
  • G02B Class
  • 51.34 % this patent is cited more than
  • 15 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges43894417191102583123228102601 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +050100150200250300350400450500550600650700750800850900950

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