Method for Forming a Nanostructure, a Nanostructure, and a Device Using the Same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
May 27, 2010
app pub date -
May 19, 2009
filing date -
Nov 24, 2008
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method for forming a nanostructure, a nanostructure and a device using the nanostructure, wherein hydroxide ions are provided to a surface of a nanostructure including a piezoelectric material in order to etch an outer surface of the nanostructure. In an exemplary embodiment, the nanostructure may be etched by contacting the nanostructure with a basic solution. In other exemplary embodiments the etching of the nanostructure may be performed while controlling at least one of the concentration of the basic solution, the temperature of the basic solution and the etching time. The resultant nanostructure includes a piezoelectric material and has an etched outer surface. The nanostructure may be applied to various devices.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully