WAFER HEAD TEMPLATE FOR CHEMICAL MECHANICAL POLISHING AND A METHOD FOR ITS USE

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United States of America Patent

APP PUB NO 20100112905A1
SERIAL NO

12261540

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Abstract

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The present invention is a planar template for a CMP tool polishing head possessing a means of securing a wafer in CMP polishing where the back surface of the template is held to the polishing head by retaining means and a method for using the planar template.

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Patent Owner(s)

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ARACA INC2550 EAST RIVER ROAD APT 12204 TUCSON AS 85718

International Classification(s)

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  • 2008 Application Filing Year
  • B24B Class
  • 512 Applications Filed
  • 341 Patents Issued To-Date
  • 66.61 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2008200920102011201220132014201520162017201820190255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Borucki, Leonard Tucson, US 8 40
Furukawa, Masanori Nagano, JP 15 131
Ichikawa, Koichiro Nagano, JP 12 126
Philipossian, Ara Tucson, US 36 607

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  • 2 Citation Count
  • B24B Class
  • 5.15 % this patent is cited more than
  • 15 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges201836341228753732601 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0102030405060708090100110120130140150160170180190200

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