ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA REACTOR
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United States of America Patent
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Issued Date -
May 6, 2010
app pub date -
Oct 15, 2009
filing date -
Nov 5, 2008
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Provided is an electrostatic chuck assembly for a plasma reactor. The assembly includes an electrostatic chuck, an electrostatic chuck cover ring, and a cathode assembly cover ring. The electrostatic chuck includes a body part and a protrusion part. The body part has a disk shape of a first diameter. The protrusion part is formed integrally with the body part and protrudes from the body part, and has a disk shape of a second diameter less than the first diameter. The electrostatic chuck cover ring is disposed to surround an outer circumference of the protrusion part. The cathode assembly cover ring is disposed at an upper part of the cathode assembly to surround an outer circumference of the electrostatic chuck cover ring and an outer circumference of the body part.
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