MO-BASED SPUTTERING TARGET PLATE AND METHOD FOR MANUFACTURING THE SAME
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United States of America Patent
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Issued Date -
May 6, 2010
app pub date -
Jan 11, 2008
filing date -
Jan 12, 2007
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Abstract
A method for efficiently manufacturing a large-area Mo-based target plate at a high yield is provided. In the manufacturing method, the condition of the content of a trace element and the rolling condition are used in combination to reduce the deformation resistance and to suppress the occurrence of cracks such as edge cracking. The method for manufacturing an Mo-based sputtering target by rolling an Mo-based ingot includes the steps of: manufacturing the Mo-based ingot in which the oxygen concentration is controlled to 10 ppm by mass or more and 1000 ppm by mass or less; and heating and rolling the Mo-based ingot at a rolling temperature of 600° C. or more and 950° C. or less.
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