Solvent Composition for Removing Radioactive Substance and Removing Material, and Method for Removing Radioactive Substance

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United States of America Patent

APP PUB NO 20100108094A1
SERIAL NO

11997278

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to a solvent composition for removing radioactive substance, characterized by comprising at least one selected from hydrofluorocarbon, hydrofluoroether, and perfluoroketone as a medium for transporting the radioactive substance, and a method for removing a radioactive substance characterized by using the solvent composition for removing.

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Patent Owner(s)

Patent OwnerAddress
DU PONT-MITSUI FLUOROCHEMICALS CO LTD5-18 SARUGAKU-CHO 1-CHOME CHIYODA-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishikawa, Junichi Tokyo, JP 65 445
Kikuchi, Hideaki Shizuoka, JP 110 1033
Nagashima, Kazuhito Tokyo, JP 3 9

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