Method and System for Automatically Generating Do-Not-Inspect Regions of a Photomask
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United States of America Patent
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app pub date -
Dec 22, 2009
filing date -
Jun 28, 2007
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Abandoned
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Abstract
A method and system for inspecting a photomask are provided. A method for automatically generating do-not-inspect regions in a photomask includes performing one or more manufacturing rules checks (MRCs) on a mask pattern file. The method may also include identifying manufacturing rule violations and automatically generating one or more DNIRs, each DNIR corresponding to a location of one or more of the identified manufacturing rule violations.
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