POLISHING PAD HAVING ABRASIVE GRAINS AND METHOD FOR MAKING THE SAME

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United States of America Patent

APP PUB NO 20100099343A1
SERIAL NO

12493491

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Abstract

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The present invention relates to a polishing pad having abrasive grains and a method for making the same. The polishing pad having abrasive grains includes a plurality of fibers, a plurality of abrasive grains and a high polymer. The fibers intersect each other to form a fiber matrix. The abrasive grains are attached to the fibers. The high polymer covers the fibers and the abrasive grains. The abrasive grains will not easily scratch a surface of a workpiece to be polished due to the flexibility of the fibers.

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Patent Owner(s)

Patent OwnerAddress
BESTAC ADVANCED MATERIAL CO LTD5F-2 NO 185 KEWANG RD LONGTAN TOWNSHIP TAOYUAN COUNTY 325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Feng, Chung-Chih Kaohsiung, TW 112 308
Hung, Yung-Chang Kaohsiung, TW 45 119
Lin, Chih-Yi Kaohsiung, TW 66 89
Tsai, Kun-Cheng Kaohsiung, TW 19 139
Yao, I-Peng Kaohsiung, TW 79 189

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