Method and Apparatus for Reacting Thin Films on Low-Temperature Substrates at High Speeds

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United States of America Patent

APP PUB NO 20100098874A1
SERIAL NO

12581606

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method for reacting thin films on a low-temperature substrate within a reactive atmosphere is disclosed. The thin film contains a reducible metal oxide, and the reactive atmosphere contains a reducing gas such as hydrogen or methane. The low-temperature substrate can be polymer, plastic or paper. Multiple light pulses from a high-intensity strobe system are used to reduce the metal oxide to metal and to sinter the metal if applicable.

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Patent Owner(s)

Patent OwnerAddress
NCC NANO LLC12221 MERIT DRIVE THREE FOREST PLAZA SUITE DALLAS TX 75251

International Classification(s)

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  • 2009 Application Filing Year
  • B05D Class
  • 2713 Applications Filed
  • 851 Patents Issued To-Date
  • 31.37 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2009201020112012201320142015201620172018201920200255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Schroder, Kurt A Coupland, US 53 452

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  • 11 Citation Count
  • B05D Class
  • 66.99 % this patent is cited more than
  • 15 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3751713951312188321001 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8091 - 100100 +0255075100125150175200225250275300325350375400425450475500525550

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