IMPEDANCE MATCHING APPARATUS FOR PLASMA-ENHANCED REACTION REACTOR
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United States of America Patent
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Issued Date -
Apr 8, 2010
app pub date -
Oct 6, 2008
filing date -
Oct 6, 2008
priority date (Note) -
Abandoned
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Abstract
An impedance matching apparatus adapted to be connected between a reaction chamber and a power source for plasma processing includes a transformer, a coil unit, and a capacitor connected in series. A primary side of the transformer is adapted to be connected to the power source, and a secondary side of the transformer has multiple taps positioned at different windings; and the coil unit is comprised of multiple coils having different inductances and arranged in parallel, wherein each tap is connected to a different coil or coils. The impedance matching circuit further includes a switch unit provided between the coil unit and the capacitor.
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