Methods for forming superconducting conductors

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United States of America Patent

SERIAL NO

11287770

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A method for producing a superconducting conductor is disclosed, including providing a substrate, depositing a buffer film having a biaxial texture to overlie the substrate by reactive sputtering, and depositing a superconducting layer to overlie the buffer film. Deposition of the buffer film is carried out by exposing the substrate along a deposition zone to a material plume generated by bombarding a target in the presence of a magnetic field, the deposition zone having a length of at least 1.0 m. The assist ions may be generated from a gridless ion source. The buffer film may have a biaxial texture having an out-of-plane crystallographic texture represented by a mosaic spread of not greater than 30°.

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Patent OwnerAddress
SUPERPOWER INCSCHENECTADY NY 12304

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Selvamanickam, Venkat Wynantskill, US 85 851

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges262761375235321912844601 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +020406080100120140160180200220240260280300

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