Low outgassing photoresist compositions

United States of America Patent

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May 31, 2011
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Mar 11, 2010
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Sep 8, 2008
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Sep 8, 2008

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Polymers for use in photoresist compositions include a repeat unit having a formula of:/s.

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GLOBALFOUNDRIES INC	MAPLES CORPORATE SERVICES LIMITED PO BOX 309 UGLAND HOUSE GRAND CAYMAN KY1-1104

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Inventor Name	Address	# of filed Patents	Total Citations
DiPietro, Richard A	Campbell, US	31	301
Sooriyakumaran, Ratnam	San Jose, US	126	2309
Swanson, Sally A	San Jose, US	21	1130
Truong, Hoa D	San Jose, US	37	289

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Low outgassing photoresist compositions

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United States of America Patent

12206065

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PATENT NO	7951525
APP PUB NO	20100062368A1
SERIAL NO	12206065
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 31, 2011	US,7951525,B2 US7951525B2	GRANTED PATENT AS SECOND PUBLICATION
March 11, 2010	US,20100062368,A1 US20100062368A1	FIRST PUBLISHED PATENT APPLICATION

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12206065

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