PHOTORESIST COMPOSTION, METHOD FOR FORMING THIN FILM PATTERNS, AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR USING THE SAME

United States of America Patent

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Issued Date
Mar 4, 2010
app pub date
Feb 19, 2009
filing date
Sep 1, 2008

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Abandoned

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Abstract

The present invention relates to a photoresist composition that comprises a resin that is represented by Formula 1, a method for forming a thin film pattern, and a method for manufacturing a thin film transistor array panel by using the same.

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Patent Owner(s)

Patent Owner	Address
SAMSUNG DISPLAY CO LTD	95 SAMSUNG 2 RO GIHEUNG-GU YONGIN-CITY GYEONGGI-DO
AZ ELECTRONIC MATERIALS (KOREA) LTD	7TH FL SHINWON BLDG #823-14 YEOKSAM-DONG GANGNAM-GU SEOUL 135-080

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hong, Pil-Soon	Suwon-si, KR	7	38
Jeon, Woo-Seok	Seongnam-si, KR	33	92
Kang, Doek-Man	Seongnam-si, KR	5	7
Lee, Chang-Ik	Cheonan-si, KR	4	73
Lee, Hi-Kuk	Yongin-si, KR	72	259
Oh, Sae-Tae	Pyeongtaek-si, KR	10	19
Park, Jung-In	Suwon-si, KR	32	108
Yun, Sang-Hyun	Suwon-si, KR	25	50

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PHOTORESIST COMPOSTION, METHOD FOR FORMING THIN FILM PATTERNS, AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR USING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12389031

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12389031

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