Coating Apparatus For The Coating Of A Substrate, As Well As A Method For The Coating Of A Substrate
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United States of America Patent
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Issued Date -
Mar 4, 2010
app pub date -
Aug 31, 2009
filing date -
Sep 2, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The present invention relates to a vaporization apparatus (1) for the vaporization of a target material (200, 201, 202). The vaporization apparatus (1) includes a process chamber (3) for the setting up and maintenance of a gas atmosphere and having an inlet (4) and an outlet (5) for a process gas, as well as an anode (6, 61) and a cylindrical vaporization cathode (2, 21, 22) formed as a target (2, 21, 22), the cylindrical vaporization cathode (2, 21, 22) including the target material (200, 201, 202). Furthermore, an electrical source of energy (7, 71, 72) is provided for the generation of an electric potential between the anode (6, 61) and the cathode (2, 21, 22) so that the target material (200, 201, 202) of the cylindrical cathode (2, 21, 22) can be transferred into a vapor phase by means of the electrical source of energy (7, 71, 72), with a magnetic field source (8, 81, 82) generating a magnetic field being provided. In accordance with the invention a cylindrical vaporization cathode (2, 21) and a cylindrical arc cathode (2, 22) are simultaneously provided in the process chamber (3). Furthermore, the invention relates to a coating method for the coating of a substrate (S).
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