METHOD AND APPARATUS FOR MODELING SKIN SENSITIZATION
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United States of America Patent
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Issued Date -
Feb 25, 2010
app pub date -
Sep 12, 2007
filing date -
Sep 12, 2006
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Abandoned
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Abstract
The invention encompasses novel computer models of chemical sensitivity of skin and systems for predicting chemical sensitivity of skin. In particular, the computer model of chemical sensitivity of skin comprises a) an epidermal compartment comprising a mathematical representation of exposure of an epidermal tissue to a chemical and a mathematical representation of a first population of antigen presenting cells interacting with the chemical; and b) a lymph node compartment comprising a mathematical representation of a second population of antigen presenting cells, and a mathematical representation of a population of T cells, wherein at least a subpopulation of the population of T cells interacts with the second population of antigen presenting cells.
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