PROCESS FOR DEPOSITING AN ELECTRICALLY CONDUCTIVE LAYER AND ASSEMBLY OF THE LAYER ON A POROUS SUPPORT SUBSTRATE

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United States of America Patent

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12349735

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Abstract

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A process for depositing an electrically conductive, preferably perovskitic layer uses a pulsed sputtering process. The layer has a low diffusivity for the elements in the iron group and is especially suitable for use in solid oxide fuel cells (SOFC). An assembly of the electrically conductive ceramic layer on a porous support substrate is also provided.

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PLANSEE SE6600 REUTTE

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kailer, Karl Breitenwang, AT 3 6
Kunschert, Georg Pflach, AT 7 20
Schlichtherle, Stefan Ehrwald, AT 5 7
Strauss, Georg Munster, AT 22 117

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