Distortion Resistant, High-Definition Litho Applique
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United States of America Patent
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Issued Date -
Feb 11, 2010
app pub date -
Aug 7, 2009
filing date -
Aug 11, 2008
priority date (Note) -
Abandoned
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Abstract
A process for creating and applying a soft, high-definition, complex shaped appliqué such that the shape of the appliqué is not distorted when stitched onto a garment and the appliqué can optionally be embroidered without requiring additional alignment processes. The appliqués are made by sublimating a high-definition image onto an upper fabric capable of retaining the high-definition image, affixing the upper fabric to a soft backing fabric capable of resisting dimensional distortion, and then laser cutting the complex shape such that the resulting appliqué can be stitched onto a garment.
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