Laser produced plasma euv light source

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United States of America Patent

SERIAL NO

12587258

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Abstract

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laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.

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Patent Owner(s)

Patent OwnerAddress
CYMER INCCALIFORNIA USA CALIFORNIA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bowering, Norbert Bielefeld, DE 20 756
Ershov, Alexander I Escondido, US 150 5453
Hansson, Bjorn Bromma, SE 16 511
Partlo, William N Poway, US 183 6942

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