SEMICONDUCTOR PROCESSING APPARATUS HAVING ALL-ROUND TYPE WAFER HANDLING CHAMBER
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United States of America Patent
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Issued Date -
Jan 21, 2010
app pub date -
Jul 16, 2008
filing date -
Jul 16, 2008
priority date (Note) -
Abandoned
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Abstract
A semiconductor manufacturing apparatus includes a wafer handling chamber; at least one wafer input/output chamber attached to the wafer handling chamber; and multiple wafer processing chambers attached to the wafer handling chamber. The wafer handling chamber has a polygonal shape on a processing chamber level on which the wafer processing chambers are installed, and one wafer processing chamber is installed on each and every side of the polygon.
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