ISOLATION FOR MULTI-SINGLE-WAFER PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
Jan 21, 2010
app pub date -
Jul 13, 2009
filing date -
Jul 11, 2008
priority date (Note) -
Abandoned
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Abstract
An MSW processing apparatus includes two or more semi-isolated reaction chambers separated from one another by isolation regions configured with two or more TIG elements, either or both of which may be independently purged. The TIG elements may be configured in a staircase-like fashion and include vertical and horizontal conductance spacings, sized so that, under different operational process temperatures of the MSW processing apparatus, a change in the horizontal conductance spacing is less than a change in the vertical conductance spacing.
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