EXHAUST GAS TRAP FOR SEMICONDUCTOR PROCESSES
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United States of America Patent
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Issued Date -
Jan 14, 2010
app pub date -
Jul 11, 2008
filing date -
Jul 11, 2008
priority date (Note) -
Abandoned
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Abstract
An exhaust gas trap for semiconductor processes includes: a trap body having an inlet port and an outlet port; an inlet shut-off valve provided at the inlet port; and an outlet shut-off valve provided at the outlet port. The trap body, inlet and outlet valves are integrated and can be removed together for replacement on refreshing of the trap.
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