METHOD FOR DEPOSITING LAYERS IN A CVD REACTOR AND GAS INLET ELEMENT FOR A CVD REACTOR

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Issued Date
Jan 7, 2010
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Nov 21, 2006
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Nov 22, 2005

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AIXTRON INC	1139 KARLSTAD DRIVE SUNNYVALE CA 94089

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Inventor Name	Address	# of filed Patents	Total Citations
Käppeler, Johannes	Wurselen, DE	15	89

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METHOD FOR DEPOSITING LAYERS IN A CVD REACTOR AND GAS INLET ELEMENT FOR A CVD REACTOR

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United States of America Patent

12094254

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12094254

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