THIN FILM ACOUSTIC REFLECTOR STACK
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United States of America Patent
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Issued Date -
Jan 7, 2010
app pub date -
Dec 7, 2005
filing date -
Dec 15, 2004
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Abandoned
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Abstract
The invention refers to a method for the fabrication of a thin film acoustic reflector stack with alternating layers of a first and a second material having different acoustic characteristic impedances, wherein the layers are deposited alternately by a reactive pulsed dc magnetron sputtering process. The invention further comprises an acoustic reflector stack fabricated thereby and an arrangement for performing the method.
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