Molecular Resist Compositions, Methods of Patterning Substrates Using the Compositions and Process Products Prepared Therefrom
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United States of America Patent
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Issued Date -
Dec 17, 2009
app pub date -
May 6, 2009
filing date -
May 6, 2008
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Abandoned
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Abstract
The present invention is directed to molecular resist compositions comprising an organic amine, methods of forming features on substrates using the molecular resists compositions and process products prepared therefrom.
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