METHOD OF FABRICATING IMAGE SENSOR DEVICE
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United States of America Patent
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Issued Date -
Dec 10, 2009
app pub date -
Jun 10, 2008
filing date -
Jun 10, 2008
priority date (Note) -
Abandoned
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Abstract
A method for fabricating an image sensor device is disclosed. A substrate having a sensing area comprising a pixel array therein is provided. A photoresist layer is coated over the substrate. Exposure is performed on at least two regions of the photoresist layer by at least two binary half-tone masks, respectively, in which a first and second binary half-tone masks of the two binary half-tone masks have different optical transparency distributions. Development is performed on the exposed photoresist layer to form a convex microlens array corresponding to the pixel array of the sensing area and comprising at least two microlenses with different convex profiles.
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