Process for depositing a thin film of metal alloy on a substrate and metal alloy in thin-film form
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United States of America Patent
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Issued Date -
Dec 10, 2009
app pub date -
Sep 10, 2007
filing date -
Sep 8, 2006
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Abstract
The present invention relates to a process for depositing a thin film of a metal alloy on a substrate, said film comprising at least four components and said alloy being either: an amorphous alloy containing 50 at % of the elements Ti and Zr, or a high-entropy alloy, the elements of which are chosen from the group consisting of Al, Co, Cr, Cu, Fe, Ni, Si, Mn, Mo, V, Zr and Ti; by simultaneous magnetron sputtering of at least two targets. The present invention also relates to a metal alloy in the form of a thin film comprising at least four components, which can be deposited on a substrate by implementing the process.
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