Imaging Diffraction Based Overlay

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20090296075A1
SERIAL NO

12129448

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An overlay error is determined using a diffraction based overlay target by generating a number of narrow band illumination beams that illuminate the overlay target. Each beam has a different range of wavelengths. Images of the overlay target are produced for each different range of wavelengths. An intensity value is then determined for each range of wavelengths. In an embodiment in which the overlay target includes a plurality of measurement pads, which may be illuminated and imaged simultaneously, an intensity value for each measurement pad in each image is determined. The intensity value may be determined statistically, such as by summing, finding the mean or median of the intensity values of pixels in the image. Spectra is then constructed using the determined intensity value, e.g., for each measurement pad. Using the constructed spectra, the overlay error may then be determined.

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Patent Owner(s)

Patent OwnerAddress
NANOMETRICS INCORPORATED930 WEST MAUDE AVENUE A CORP OF CA SUNNYVALE CA 94086

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hu, Jiangtao Sunnyvale , US 137 1615
Liu, Zhuan Fremont , US 21 78
Rabello, Silvio J Palo Alto , US 7 171
Saravanan, Chandra Saru Fremont , US 1 25
Smith, Nigel P Hsinchu , TW 19 254

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