PHOTOIRRADIATION APPARATUS, CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, AND DEVICE

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United States of America Patent

APP PUB NO 20090278060A1
SERIAL NO

12417838

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Abstract

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A photoirradiation apparatus includes an optical modulation element which phase-modulates light, an illumination system to illuminate the optical modulation element, and an imaging optical system which applies the phase-modulated light to a non-single-crystal semiconductor film to form a predetermined light intensity distribution with a strip-like repetitive region having long sides adjacent to each other. The light intensity distribution has a distribution which is downwards convex along a center line in a short side direction and a center line in a long side direction of the repetitive region. The light intensity distribution includes isointensity lines each bent to form a projection from a center of the repetitive region outward in the long side direction. A radius of curvature of an end of at least one isointensity line is not more than 0.3 μm. A pitch of the repetitive region in the short side direction is not more than 2 μm.

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Patent Owner(s)

Patent OwnerAddress
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO LTD66-2 HORIKAWA-CHO SAIWAI-KU KAWASAKI-SHI KANAGAWA 212-0013

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
AZUMA, Kazufumi Yokohama-shi , JP 28 760
ENDO, Takahiko Okegawa-shi , JP 51 369
MATSUMURA, Masakiyo Kamakura-shi , JP 78 543
TANIGUCHI, Yukio Matsudo-shi , JP 107 1655

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