Method for the Determination of the Surface Occupation of a Silica Glass Component
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United States of America Patent
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Issued Date -
Nov 12, 2009
app pub date -
Dec 12, 2006
filing date -
Dec 14, 2005
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Abandoned
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Abstract
also directly in situ. Said aim is achieved by the fact that taking the sample encompasses contacting the component surface with an acidic desorption solution containing water, nitric acid, and hydrofluoric acid, the nitric acid concentration in the desorption solution amounting to 1.5 to 5 times the hydrofluoric acid concentration (in percent by volume), provided that the contact time and the contact temperature are adjusted such that a maximum of 0.5 ?m of the component surface are removed.
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